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Low tolerance Carbon C sputtering target Ion Beam Sputtering

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unit price: negotiable
min amount:
amount:
period for delivery: Consignment Deadline Days
area: Beijing
Expiry date : Long Effective
last update: 2017-12-20 02:07
view count: 44
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Product details
C target Carbon target (MAT-CN)

Physical properties

Color black

Density 2.26g/m³

Melting point 3500

Technical indicators

purity 99.99%

Relative density >99.9%

Cut surface flatness 3.2Ra

Tolerance ±0.1mm

grain size uniform

Material C

Brand MAT-CN

Origin Nanchang Jiangxi China

Specifications

Size 1: diameter <360mm

thickness> 1 mm

(wafer / round table / rod)

Size 2: length <300mm

width <300mm

thickness> 1mm

(rectangular / sheet /splicing)

Size 3: outer diameter <360mm

inner diameter> 1mm

length> 1 mm

(pipe / ring / rotatable targets)

Size 4:be customized according to user needs, sample processing, to map processing

Minimum order quantity 1 piece,large concessions

Supply capacity the same batch, the same material, continuous and reliable supply; 100 kg / month min

Delivery time 3 weeks after payment,excluding special materials

Production process vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining

Applicable instruments various models magnetron sputtering equipment, etc.

Product uses industrial-grade coating, experiments or research level C target electronics, optoelectronics, military, decorative, functional film

Advantages quality

1. reasonable price and good quality

2.high purity, less impurities

3.dense, rolling, oxidation, forming plasticizers

4.relatively high density, grain uniformity axis, consistency

Product accessories
formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice

Packing vacuum
packaging / vacuum neutral packing / special packaging outside reinforcement package

Mode of transport for
domestic express carrier DHL, FEDEX, EMS, UPS(FOB/CIF)---safe, fast and reliable
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